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Silicides and Nitrides Formation in Ti Films Coated on Si and Exposed to (Ar-N2-H2) Expanding Plasma

机译：在si上涂覆并暴露于（ar-N2-H2）膨胀等离子体的Ti膜中硅化物和氮化物的形成

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International audience

机译：国际观众

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Jauberteau, Isabelle; Mayet, Richard; Cornette, Julie; Mangin, Denis; Bessaudou, Annie; Carles, Pierre; Jauberteau, Jean-Louis; Passelergue, Armand;
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年度 2017
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1. Silicides and Nitrides Formation in Ti Films Coated on Si and Exposed to (Ar-N 2 -H 2 ) Expanding Plasma [J] . Isabelle Jauberteau, Richard Mayet, Julie Cornette, Coatings . 2017,第2期

机译：在Si上涂覆并暴露于（Ar-N 2 -H 2）膨胀等离子体的Ti膜中形成硅化物和氮化物
2. Competing growth of titanium nitrides and silicides in Ti thin films processed in expanding microwave plasma: Morphology and microstructural properties [J] . Isabelle Jauberteau, Pierre Carles, Richard Mayet, AIP Advances . 2018,第9期

机译：在扩展的微波等离子体中处理的钛薄膜中氮化钛和硅化物的竞争性生长：形貌和微观结构性质
3. Competing growth of titanium nitrides and silicides in Ti thin films processed in expanding microwave plasma: Morphology and microstructural properties [J] . Isabelle Jauberteau, Pierre Carles, Richard Mayet, AIP Advances . 2018,第9期

机译：在扩展的微波等离子体中处理的钛薄膜中氮化钛和硅化物的竞争性生长：形貌和微观结构性质
4. HARDNESS EVALUATION, STOICHIOMETRY AND GRAIN SIZE OF TITANIUM NITRIDE FILMS OBTAINED WITH PLASMA NITRIDING ON TI-6AI-4V SAMPLES [C] . Marcos Antonio Zen Vasconcellos, Saulo Cordeiro Lima, Ruth Hinrichs ABM international congress;IFHTSE congress;TMS/ABM international materials congress . 2011

机译：在TI-6AI-4V样品上进行等离子氮化处理的氮化钛膜的硬度评估，化学计量和粒度
5. Atomic Layer Deposition and Direct-Liquid-Injection Chemical Vapor Deposition of Nickel Nitride Films and Their Conversion to Nickel Silicide Films. [D] . Li, Zhefeng. 2011

机译：氮化镍膜的原子层沉积和直接液化化学气相沉积及其转化为硅化镍膜。
6. Structural Compositional and Plasmonic Characteristics of Ti–Zr Ternary Nitride Thin Films Tuned by the Nitrogen Flow Ratio in Magnetron Sputtering [O] . Lianlian Chen, Yujing Ran, Zhaotan Jiang, 2020

机译：通过磁控溅射中氮流量的氮气流量调节的Ti-Zr三元氮化物薄膜的结构组成和等离子体特性
7. Silicides and Nitrides Formation in Ti Films Coated on Si and Exposed to (Ar-N2-H2) Expanding Plasma [O] . Jauberteau, Isabelle, Mayet, Richard, Cornette, Julie, 2017

机译：在si上涂覆并暴露于（ar-N2-H2）膨胀等离子体的Ti膜中硅化物和氮化物的形成

Silicides and Nitrides Formation in Ti Films Coated on Si and Exposed to (Ar-N2-H2) Expanding Plasma

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